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Characterization of N Rich-Silicon Nitride Thin Films Deposited by PECVD
Authors
Prof. Dr. İpek GÜLER
Çankaya Üniversitesi, Türkiye
Article Type Özgün Makale
Article SubType SSCI, AHCI, SCI, SCI-Exp dergilerinde yayımlanan tam makale
Journal Name The Electrochemical Society
Journal ISSN 2162-8769
Indexes covering the journal SCI-Expanded
Journal Quartile Q3
Article Language Türkçe
Publication Date 04-2023
Volume 12
DOI Number 10.1149/2162-8777/acc971
Article URL http://dx.doi.org/10.1149/2162-8777/acc971
Citations
SSCI/AHCI/SCI/ESCI 0
Scopus Citations 0
Other Citations 0
Characterization of N Rich-Silicon Nitride Thin Films Deposited by PECVD